Document Details

Document Type : Article In Journal 
Document Title :
The influence of change in silane concentration and substrate temperature on optical properties of hydrogenated microcrystalline silicon films
The influence of change in silane concentration and substrate temperature on optical properties of hydrogenated microcrystalline silicon films
 
Subject : Physics 
Document Language : English 
Abstract : The influence of change in deposition conditions of silane concentration and substrate temperature on optical properties of hydrogenated microcrystalline silicon thin film samples prepared by Plasma Enhanced Chemical Vapor Deposition (PECVD) technique, are investigated. The crystalline volume fraction for the samples determined from Raman spectra are correlated with the silane concentration, substrate temperature, deposition rate, absorption coefficient, refractive index and optical energy gap. In addition, a decrease in crystalline volume fraction is found accompanied by a decrease in both dark and photo- conductivities. The values of optical parameters (refractive index and absorption coefficient) are calculated from the transmission spectra in the range 400-2500nm and then used to determine optical band energy gap and Urbach energy. All these values are fairly compared to those obtained by different techniques. 
ISSN : 1454-4164 
Journal Name : Journal of optoelectronics and adavnced materials 
Volume : 11 
Issue Number : 5 
Publishing Year : 2009 AH
2009 AD 
Article Type : Article 
Added Date : Monday, December 7, 2009 

Researchers

Researcher Name (Arabic)Researcher Name (English)Researcher TypeDr GradeEmail
رشاد إبراهيم بدرانBADRAN, R IResearcherDoctoraterbadran@hau.edu.sa
صالح هديهد الحنيطيAL-HENITI, S HResearcherDoctoratesalheniti@kau.edu.sa
فرج سعيد الحازميAL-HAZMI, F SResearcherDoctorateFalhazmi@kau.edu.sa
أحمد عبدالله الغامديAL-GHAMDI, Abdullah AResearcherDoctorateAGAMDI@kau.edu.sa
- -LI, J ResearcherDoctorate 
- -XIONG, S ResearcherMaster 

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